The effect of ionizing radiation and etching time on low-temperature relaxation in polyvinylidene fluoride
DOI:
https://doi.org/10.33910/2687-153X-2024-5-3-124-128Keywords:
polyvinylidene fluoride, thermal activation spectroscopy, thermostimulated depolarization, track membranes, swift heavy ions (SHI)Abstract
This study examined the relaxation behavior of the semi-crystalline polymer polyvinylidene fluoride (PVDF) using the thermally stimulated depolarization (TSD) method. Experimental measurements were performed on thin PVDF films irradiated with heavy ions Ne4+, Xe26+, and Bi52+ with energies of about 1.2 MeV/nucleon for Ne4+ and Xe26+, and about 3.1 MeV/nucleon for Bi52+. Analysis of the obtained TSD spectra revealed the presence of three main relaxation processes at temperatures of around –45 °C, 20 °C and 40 °C. The subsequent chemical etching of the films was found to lead to the emergence of a new relaxation process at a temperature of about –10 °C, which may be due to the appearance of a new type of relaxers on the surface of the tracks.
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